Abstract
This work presents the results of computer modeling of crystallographic texture evolution in the volume of Ti Grade 4 billets subjected to continuous equal channel angular pressing (ECAP) at a temperature of 200°С, with a number of passes from 1 to 8 via the ВС route. Regularities of preferred orientation formation have been stated, and the activity of some or other slip and twinning systems in Ti billets has been evaluated against the number of ECAP passes. The obtained results explain and allow predicting the behavior of nanostructured Ti Grade 4 with account of the parameters of its microstructure and crystallographic texture. The obtained modeling results are compared with the results of experimental X-ray studies.
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