Abstract
AbstractA pulsed PECVD reactor has been successfully constructed for laboratory scale studies of plasma polymerized thin films. A computer control system based on National Instrument's LABVIEW software controls power supply sequence, feed injection, and introduction of RF energy. An optical fiber and a photo diode allow the user to monitor the emitted light for each pulse. A fast ionization gauge is used to characterize the pressure evolution over time, subsequent to acetylene gas injection. Substrates with diameter as large as 10 cm can be accommodated within the reactor. Both aniline liquid and acetylene gas have been used as reactor feed. The deposited plasma-polymerized films were characterized using AFM and SEM. Electrical conductivity of plasma polymerized acetylene film was also measured
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
