Comprehensive review of the morphological, linear and nonlinear optical characterization of spin-coated NiO thin films for optoelectronic applications

Abstract

In the last few years, Nickel Oxide (NiO) started to be regarded as one of the most auspicious oxides that have been elaborated through several methods to eventually be used in optoelectronic applications, owing to its intriguing properties namely chemical stability, magnetic, optical and electrical as well as its wide-band-gap that ranges between 3.25 and 4.0 eV. We will initiate this review by providing an exhaustive description of the spin-coating method which is classified among the leading techniques to deposit an extensive variety of materials in thin film form. Then we will examine the structural, morphological, linear and nonlinear optical characteristics of the doped and undoped NiO thin films prepared by this technique. The improvement in quality and deposition efficiency of thin films is extremely crucial and it can be attained by optimizing the elaboration parameters of the spin-coating technique.