Composition, Structure and Mechanical Properties of CrAlC Films Deposited by Arc Sputtering Technique

Abstract

A focus point in this work was the research of the influence of deposition condition on properties of CrAlC films. CrAlC films were deposited by arc sputtering technique using arc sputtering of Cr-Al target and pulse arc sputtering of graphite target at different frequency. The multilayer [(CrAlC)+(a-C)]ncoatings were also obtained and investigated. Multilayer [(CrAlC)+(a-C)]nwere deposited with a systematic alternation of the pair [(CrAlC)+(a-C)], where a-C is the amorphous carbon layer. The structure, mechanical properties and fracture toughness of CrAlC films depend on pulse frequencies of the graphite sputtering. With increasing pulse frequency, the film structure changes from uniformly amorphous to amorphous with nanograins, the hardness of the films increases, the critical load of crack formation and film peeling tend to decrease. It is shown that a decrease in the thickness of the layers in [(CrAlC)+(a-C)]nleads to an increase in the crack resistance.