Abstract
USB-15 boron-mixed graphite samples subjected to bombardment with 90-eV ions of an accelerated oxygen plasma flow are investigated via scanning electron microscopy, X-ray microanalysis, X-ray diffraction analysis, and mass spectrometry of the thermal-desorption kinetics and volatile compounds. It is revealed that the surface is enriched with oxygen and irradiation is not accompanied by structural changes. The material possesses an imperfect fine-grained structure with a very low graphitization level. Thermal-desorption mass spectrometry indicates that spectral lines of boron oxide appear at temperatures of greater than 150°C and reach their maximum at 320–410°C. This corroborates the assumption that an inert boron-oxide film is formed on a cold USB-15 surface under the action of oxygen ions and evaporates with increasing temperature. The latter leads to a loss in the protective properties of the boron dopant.
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