Abstract
The reaction of plain titanium and superficially siliconized titanium (Ti 5Si 3 coating) was studied in SO 2 atmospheres. For the uncoated metal, the kinetics obeyed a parabolic rate law between 550 and 800 °C, without any influence of the pressure. For the coated titanium, the rate law was linear between 745 and 960 °C (except for the first few hours) and the rate constant was proportional to the square root of the SO 2 pressure. In both cases an oxide scale was formed on top of a thin titanium monosulphide film adjacent to the substrate. Diffusion of SO 2 through the oxide scale is thought to be one of the limiting steps for the reaction with the uncoated titanium but not with the coated specimen. For the coated titanium, the reaction is probably controlled by the interfacial reaction of sulphur with Ti 5Si 3.
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