Abstract
We have studied the deposition of AlCoCrCuFeNi high entropy alloy (HEA) thin films on Si (1 0 0) substrates by DC magnetron sputtering process. Three mosaic targets have been used for easily tailoring the film composition. Energy dispersive X-ray spectrometry analysis has shown that chemical composition can be modified around the nominal value by tuning the ratio of the powers applied to the magnetron targets. The deposition rate is directly related to the power sum. Moreover, various surface morphologies have been evidenced by scanning electron microscopy and correlated to the crystalline phases present in the films. Morphology and crystalline structure have been found to depend on the chemical composition. Wetting contact angle has been measured with water droplets, showing that the hydrophobic properties of the thin films depend on their characteristics.
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