Abstract

ZnO is of great interest for large-area optoelectronic devices, e.g., flat panel displays, light-emitting diodes, transparent semiconductors, and transparent conductive oxides (TCOs) etc., owing to its good optical properties. In the present study, quaternary ZnO thin films are deposited on a soda lime glass substrate using Mg and group III elements, such as Al, Ga, and In, to enhance the optical and electrical properties. The structural, optical, and electrical properties of quaternary ZnO TCO materials are investigated for improved thin film solar cell performance. All of the films show a uniform microstructure without any void and crack and have a transmittance over 75% in the visible region. They possess comparable band gap differences. Especially, as for the optical properties, a Mg and Ga co-doped ZnO, MgGaZnO (MGZO) thin film shows a high optical band gap of 3.87 eV with a transmittance of about 90% in the visible region. In addition, the MGZO thin film shows improved electrical properties with the lowest resistivity of 3.97 × 10−4 Ωcm, higher carrier concentration of 1.11 × 1021cm−3, high mobility of 14.07 cm2V−1s−1 and lower sheet resistance of 7.39Ω/sq. Moreover, a wide band gap of 3.87 eV is obtained for MGZO thin films, and the performance of a Cu2ZnSn(S, Se)4 (CZTSSe) photovoltaic device fabricated with a MGZO TCO layer is improved owing to higher band gap and outstanding electronic properties. The improved short circuit current results in a device with a MGZO thin film with a power conversion efficiency of 8.79%.

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