Abstract
TiO2 thin films were prepared on glass substrates using the PLD (Pulsed Laser Deposition) technique. In order to carry out the ablation process, a Nd:YAG laser was used emitting in 1064 nm wavelength at 10 Hz repetition rate, set up for operating in both single-pulse and multi-pulse regimes. A comparison of the deposition rate, the optical and morphological properties of the layers obtained from both ablation regimes was made, which showed that the multi-pulsed ablation produced layers with a higher surface quality and better optical properties.
Highlights
Titanium dioxide (TiO2) has become an extremely valuable metallic oxide for many technical applications in different uses due to its unique electrical and optical properties and the fact that it is not toxic and has a low cost [1]
TiO2 thin films have a wide spectrum of applications in photocatalysis, photovoltaic and optical systems, especially in multilayer structures that can be anti-reflecting or have a high reflectance level at a specific wavelength [2]
This paper describes the use of the Pulse Layer Deposition (PLD) technique for producing TiO2 thin films with the two ablation regimes: single-pulse and multi-pulse, and the optical and morphological properties, as well as the deposition rates are evaluated for the purpose of establishing the potential of the multi-pulse regime as an excitation source in PLD
Summary
Titanium dioxide (TiO2) has become an extremely valuable metallic oxide for many technical applications in different uses due to its unique electrical and optical properties and the fact that it is not toxic and has a low cost [1]. (2015) Comparison on Morphological and Optical Properties of TiO2 Thin Films Grown by Single-Pulse and Multi-Pulse Laser Ablation. Jedlinszki and Galbács show in [14] that in principle it is possible to reach higher levels of plasma ionization when the laser emits multi-pulse regime This can be a very interesting point in the PLD technique, as higher plasma ionization levels, with the presence of very energy-rich species, may contribute to the growth of the film by transferring energy to the process. This paper describes the use of the PLD technique for producing TiO2 thin films with the two ablation regimes: single-pulse and multi-pulse, and the optical and morphological properties, as well as the deposition rates are evaluated for the purpose of establishing the potential of the multi-pulse regime as an excitation source in PLD
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