Abstract
Monolayer and bilayer coatings of TiAlN, AlCrN, and AlCrN/TiAlN were deposited onto tungsten carbide inserts using the plasma enhanced physical vapor deposition process. The microstructures of the coatings were characterized using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The SEM micrographs revealed that the AlCrN and AlCrN/TiAlN coatings were uniform and highly dense and contained only a limited number of microvoids. The TiAlN coating was non-uniform and highly porous and contained more micro droplets. The hardness and scratch resistance of the specimens were measured using a nanoindentation tester and scratch tester, respectively. Different phases formed in the coatings were analyzed by X-ray diffraction (XRD). The AlCrN/TiAlN coating exhibited a higher hardness (32.75 GPa), a higher Young’s modulus (561.97 GPa), and superior scratch resistance (L CN = 46 N) compared to conventional coatings such as TiAlN, AlCrN, and TiN.
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