Comparison of the long time stability of some SiCxOy: H films and related compounds with respect to postdeposition incorporation of OH groups

Abstract

Thin films with composition SiCxOy: H and SiOx:H, produced under different industrial conditions (high rates) have been measured by IR spectroscopy in order to examine the incorporation of OH groups of water. These measurements have been repeated for a period of three weeks to investigate the hygroscopic behaviour. The sample produced with PVD is hydrogen free and only a small degree of OH incorporation takes place. The other samples produced by CVD methods show various amounts of hydrogen concentration. In some cases the composition changes drastically which has also been confirmed by XPS measurements.