Abstract
The chemical structure and composition of ultrathin N2O oxides have been investigated using angle resolved x-ray photoelectron spectroscopy and compared to those of reoxidized NH3-nitrided SiO2. It is found that N2O oxide shows a second nitrogen-related bond (N—O bonds) in close proximity to the SiO2/Si interface in addition to the typically observed Si—N bonds in reoxidized NH3-nitrided SiO2. In addition, the change of the difference between Si 2p and O 1s binding energies in the N2O oxide and reoxidized NH3-nitrided SiO2 with the take-off angle is negligible due to the interfacial nitrogen incorporation.
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