Abstract
TiN and TiAlN films have been coated on the surface of tool materials by various methods for the life-time extension of tool. In this work, for the improvement of hardness and adhesion of coating to SKD61 substrate, radical nitriding (RN) of substrate was carried out at 450°C for 5 hours in ammonia gas pressure of 2.7×103 Pa. The results showed that TiN and TiAlN coatings were distributed uniformly on the SKD 61 substrate. And the film thickness was up to 4 μm, which showed so high deposition efficiency (~ 66.7 nm/min) of arc ion plating at this typical process condition. For both coatings, the TiN phases could be detected and the (111) was dominant crystallite grown orientation. The AlN crystallite structure could be detected as expected in TiAlN film. The critical load of TiN film (22.36 N) was slightly smaller than that of TiAlN film (23.88 N). With increasing the load during scratch test, the friction coefficient of TiN film rose quickly, but friction coefficient of TiAlN had a little change, even decreased slightly.
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