Comparison of phonon scattering in nanowire field effect transistors with Si, GaAs and InGaAs cores using the NEGF formalism

Abstract

Using the Non-equilibrium Green's Function (NEGF) formalism, the impact of electron- phonon scattering on the performance of different core nanowire field effect transistors (NWFETs) has been investigated. Three core materials have been considered: Si, GaAs and InGaAs. The effective mass approximation has been used, with masses extracted from tight- binding simulations. The ID-VG characteristics at low and high drain bias are shown. It was found that at low drain bias, scattering caused a 86%, 72% and 50% percentage reduction in the current at high gate bias in the Si, GaAs and InGaAs core, 2.2 × 2.2 nm2 cross-section NWFETs respectively. The phonon-limited mobility and percentage tunnelling have also been calculated.