Abstract

The structure, formation energy and energy levels of the oxygen vacancies in crystalline and amorphous Ta2O5 have been calculated by first principle methods. In the crystalline phase, the 2-fold coordinated intra-layer vacancy is the lowest cost vacancy, and forms a deep level 1.5eV below the conduction band edge. The 3-fold intra-layer vacancy and the 2-fold inter-layer vacancy are higher cost defects, and form shallower levels. In the amorphous phase, the lower density results in higher concentration of inter-layer like 2-fold O coordination. The O vacancy diffusion barrier is 0.1–0.3eV in both cases.

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