Abstract
In this study, bismuth trioxide (Bi2O3) membranes in an electrolyte–insulator–semiconductor (EIS) structure were fabricated with pH sensing capability. To optimize the sensing performance, the membranes were treated with two types of plasma—NH3 and N2O. To investigate the material property improvements, multiple material characterizations were conducted. Material analysis results indicate that plasma treatments with appropriate time could enhance the crystallization, remove the silicate and facilitate crystallizations. Owing to the material optimizations, the pH sensing capability could be greatly boosted. NH3 or N2O plasma treated-Bi2O3 membranes could reach the pH sensitivity around 60 mV/pH and show promise for future biomedical applications.
Highlights
Fifty years ago, the first ion-sensitive field-effect transistor (ISFET) was invented by Bergveld in 1970 [1,2]
NH3 and N2O plasma treatment were performed on the membran results indicated that the sample treated with NH3 plasma for 3 min and the samp
To boost the sensing performance, NH3 and N2O plasma treatment were performed on the membranes
Summary
The first ion-sensitive field-effect transistor (ISFET) was invented by Bergveld in 1970 [1,2]. To enhance the sensing capability, Bi2O3 membranes were treated with two types of plasmaNH3 and N2O [13,14]. Material analysis results indicate that Bi2O3 membranes treated with NH3 plasma for 3 min and N2O plasma for 1 min had strong crystallization, silicate suppression, high grainization, and effective nitrogen passivation. The pH sensing measurements [15] indicate that Bi2O3 membranes treated in these plasma treatment conditions had high pH sensitivity around 60 mV/pH and high linearity close to 100%. Fair linearity, stable response, Bi2O3-based EIS membranes [26] with NH3 or N2O plasma treatments show promise for future industrial biomedical sensing [27] applications
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