Abstract
Titanium dioxide (TiO2) films were deposited on unheated Si(100) wafers by single- and dual-cathode dc unbalanced magnetron sputtering. Each cathode was specially designed with a high magnetic field strength. The effect of the radial distance from the center of the coating cathode on the film structures was investigated. For the substrate placed at the center of the coating cathode, it was found that the TiO2 films deposited by dual-cathode sputtering exhibit rutile with higher crystallinity than films deposited by single-cathode sputtering. At various radial distance from the center to 6 cm to the left and light of the center, mixed phases of rutile and anatase were observed on TiO2 films deposited using both single- and dual-cathode sputtering systems. Furthermore, in the case of using dual-cathode, crystalline TiO2 films were obtained for a longer range to the left of the center than to the right owing to the higher magnetic field strength.
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