Abstract
Enhancement of line x-ray emission from both solid and porous iron targets induced by irradiation of single and double laser pulses is studied numerically. The line emission from laser produced plasma is calculated within the extreme ultra-violet lithography wavelength range of 13.5–13.7 nm. The effects of pre-pulse intensity and delay time between two pulses (pre-pulse and main pulse) are examined. The results show that using double pulses irradiation in the conditions of porous target can reduce the x-ray enhancement. According to the results, the use of both pre-pulse and porous target leads to efficient absorption of the laser energy. Calculations also show that such enhanced laser absorption can ionize atoms of the target material to very high degrees of ionization, leading to decrease of the density of appropriate ions that are responsible for line emission in the selected wavelength region. By increasing the target porosity, x-ray yield was more reduced.
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