Abstract
The tantalum tungsten alloys, Ta-2.5 W and Ta-10 W, were treated with isothermal ion nitriding and two-stage ion nitriding experiments to obtain a nitride layer. After the treatment, the hardness of both alloys has been remarkably improved, which can be attributed to the formation of nitride phase θ-TaN in the surface layer according to the XRD pattern. Comparing with isothermal ion nitriding, the two-stage ion nitriding experiment achieved greater microhardness and thickness of the nitride layer. In addition, T-2.5 W alloy showed a greater layer thickness and microhardness than Ta-10 W alloy with the same treatment, which indicates that the nitriding process decreases with the increase of tungsten content.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
