Comparison of formation of carbon on aluminum and graphite substrates by a low energy plasma focus device

Abstract

Characterization of carbon structure was studied through deposition of carbon films on three different substrates at various angular positions. The thin films were prepared by a low energy plasma focus device and placed on graphite, aluminum, and magnesium substrates. The deposition process performed in presence of an active, as well as a noble gas, namely nitrogen and argon. The synthesis of thin films deposited at lower angular position shows nano-crystalline graphite and amorphous carbon structures. A carbon crystal has been detected for deposition at higher angular positions. The characterization of the crystal was investigated and it was revealed that the deposited thin film has hexagonal crystal structure. Further study of crystal led to the conclusion that it can be categorized under crystalline aromatic network. The surface of all synthesized films containing crystalline aromatic network was yellowish orange color (golden). The characterization of each structure was verified by x-ray diffraction (XRD), Raman spectroscopy, field emission scanning electron microscopy (FESEM), nano-indentation, Fourier transform infrared spectroscopy (FTIR), and transmission electron microscopy (TEM) analyses. Raman spectroscopy was used as a base analysis to classify carbon structures. Raman parameters of natural graphite structure, such as G peak position and ID/IG ratio, as well as, those of carbon crystal, nano-crystalline graphite, and amorphous carbon were identified.