Abstract

In order to provide information from a new direction on the temperature variation of the barrier symmetry factor, β, and the corresponding Tafel slope, b=RT/βF, for the step of proton discharge at the Hg electrode, the kinetics of the cathodic H2 evolution reaction have been studied over a wide temperature range through the melting point of Hg from several proton donors, in a series of suitable non-aqueous solvents that enable low-temperature experiments to be performed. The potential dependence of both the heat and entropy of activation has been determined through the melting point of Hg, enabling the corresponding enthalpic (βH) and entropic (βS) components of β in the relation β=βH+TβS to be evaluated. Substantial differences in βH and βs for solid and liquid Hg surfaces are found including, in some cases, a difference of sign of the βs factor. The temperature-dependence of β, which is associated with the non-conventional variation of b with temperature, now demonstrated for many systems, arises in a complex way which is depnendent on the state and structure of the electrode metal's surface, in relation probably to solvent adsorption and orientation at the interface. The usually assumed value of 0.5 for the barrier symmetry factor is entirely coincidental when this quantity is identified with βH, derived for 298 K. Only when βs= 0, is βH near 0.5, otherwise there is a compensatory variation of βH with Tβs at a given T.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.