Abstract
Airborne molecular contamination (AMC) continues to grow as a major contamination control issue for microelectronics manufacturers. Because of this growth, chemical filter manufacturers are offering a large number of AMC control options from which the facility, process, and contamination control engineers must determine the best solution for their specific AMC control application(s). This paper will present information on the various types of chemical filters available, filter strengths and weaknesses, and the results of independent performance evaluations for a number of different chemical filter types. Several AMC control strategies employing chemical filtration will be discussed. Other topics include an introduction to gaseous contaminants and a definition of AMC; classifications of AMC; contaminants common to cleanroom applications, their sources, and effect; implementing AMC control—a three-step methodology for optimum control of AMC; gas-phase air filtration principles—adsorption, absorption, chemisorption, and factors affecting each; dry-scrubbing air filtration media—plain and chemically impregnated adsorbents; chemical filtration equipment designs—thin-bed and deep-bed systems; and AMC monitoring—passive and real-time reactivity monitors.
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