Abstract
Optically polished crystalline quartz samples were implanted at room temperature by 2.6 MeV Ni + ions with a dose of 9×10 14 ions/cm 2 and 2.0 MeV He + ions with a dose of 1.5×10 16 ions/cm 2, respectively. A comparison of the MeV Ni + ion-implanted planar waveguide formation was made with the MeV He + ion-implanted one. The prism-coupling method was carried out to measure the dark modes in the quartz waveguides by using model 2010 prism coupler. Five modes were observed in the Ni + implanted waveguide while 15 modes were found in the He + ion-implanted one. Reflectivity calculation method was applied to fitting the refractive index profile. TRIM’98 (transport of ions in matter) code was used to simulate the damage profile in quartz by MeV Ni + and He + ions implantation, respectively. It is found that the refractive index profile in MeV Ni + ions implanted waveguide is somewhat different in shape from that in MeV He + ions implanted waveguide.
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