Abstract
Absorption spectroscopy technique was used to measure the densities of sputtered atoms in the ground state and metastable state in pulse-modulated sputtering plasmas with compound Cu2ZnSnS4(CZTS) target. At a fixed discharge power, the absolute metastable densities of sputtered Cu, Zn, and Sn atoms increased with the argon pressure. This characteristic is believed due to the enhancement of plasma density with increasing argon pressure, which would increase the excitation rate of sputtered atoms. In addition, the metastable state densities of sputtered atoms are equal or higher than that of the ground state densities. Therefore, these experimental results reveal that the contribution of metastable atoms should be taken into account during the calculation and simulation of thin film growth via sputtering plasmas.
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