Abstract
UV-IR cutoff filters consisting a number of alternating layers of TiO2 and SiO2 were prepared by reactive electron-beam deposition (EBD) at a glass-substrate temperature of 300°C and by reactive ion- assisted deposition (IAD) at an ambient substrate temperature. All the filters were prepared in the same coater, equipped with two electron beam guns and one advanced plasma source. The uniformity and repro- ducibility of filters prepared by both techniques were investigated and compared, and correlated with results from single-layer materials. The useful sample radii, with optical thickness variation less than 1.6%, for EBD and IAD filters were up to 50 and 30 cm, respectively. The run-to- run reproducibility of EBD filters was as good as or even better than that of IAD filters. However, the temperature stability of IAD filters was supe- rior to that of EBD filters, which confirmed that the energetic ion bom- bardments made the component films denser. © 1998 Society of Photo- Optical Instrumentation Engineers. (S0091-3286(98)03405-9) Subject terms: UV-IR cutoff filters; reactive electron-beam deposition; reactive ion-assisted deposition; advanced plasma source; uniformity; reproducibility; tem- perature stability.
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