Comparative Study of Total Power Density at a Substrate in Pulsed DC Magnetron and Hollow‐Cathode Plasma Jet Sputtering Systems

Abstract

AbstractThe pulsed DC magnetron and hollow‐cathode plasma jet sources have been studied from the point of view of total energy flux density at a “floating” substrate. Both plasma sources were operated under identical experimental conditions and differences between both systems were investigated. The aim of this work is focused on the characterization of total power density at electrically isolated substrate for various duty cycles and for different pulsing frequencies. A calorimeter probe with incorporated thermocouple junction was used for measurement of the total power density on the substrate. The main results from the calorimeter probe show clearly that total power density at the substrate is much higher for the planar magnetron operating at low duty cycle and high pulsing frequency than for the plasma jet. The total power density measured in the planar magnetron depends more strongly on the duty cycle and the pulsing frequency than measured in the plasma jet.