Abstract

Comparative experiments are performed between continuous and pulsed electron cyclotron resonance discharges for the deposition of poly-Si films. The measured selectivity of over in the pulsed discharges is larger than in the continuous discharges by more than a factor of four. As a consequence, deposited poly-Si films in the pulsed discharge contain fewer hydrogenated bonds than in the continuous discharges. Two-dimensional fluid simulation is also performed to obtain spatial and temporal evolution of plasmas and radical species. It is confirmed that the simulation results are in qualitative agreement with the experimental results.

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