Abstract

A comparative study of n-MgZnO/p-Si UV-B photodetector performance was carried out with different device structures. The experimental results demonstrate superior photoresponse characteristics of the p-n heterojunction detector against the Schottky type metal-semiconductor-metal counterpart, including a sharper cutoff wavelength at 300 nm, a larger peak photoresponsivity of 1 A/W, and a faster response speed. The role of built-in field and low interface scattering in p-n heterojunction is explored, and the energy band diagram of n-MgZnO/p-Si is employed to interpret the efficient suppression of visible light photoresponse from Si substrate, revealing the applicability of this heterostructure in fabrication of deep ultraviolet detectors.

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