Abstract
This study focuses on transparent solar cell device fabrication using amorphous and crystalline oxide semiconductors. Radio frequency magnetron sputtering was used to fabricate Fluorine doped Tin Oxide/n-Indium Gallium Zinc Oxide/p-Nickel Oxide/Silver nano wires and Fluorine doped Tin Oxide/n-Indium Tin Oxide/p-Nickel Oxide/Silver nano wires devices. Deposition conditions for n and p-type semiconductors were optimized and analyzed. Silver Nanowires were spin-coated as top contacts. The solar cells were exposed to 365 nm, and their current voltage characteristics were analyzed. This novel approach using amorphous oxide semiconductors provides insights for high-efficiency device fabrication.
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