Abstract
We report the results of examination of incorporation of chlorine and fluorine into silica as revealed from secondary ion mass spectroscopy (SIMS) and Raman spectroscopy measurements. The samples were preform-like rods made by the MCVD process. SIMS spectra were used for quantitative analysis of Cl concentration in glass. The concentrations of F were obtained from the Raman spectra. Both spectroscopic methods indicated the presence of SiCl groups in SiO 2 synthesized from chlorine-rich vapour gaseous blend. The difference in structural roles of Cl and F in chemically deposited silica manifests itself in the efficiency of their bonding to Si and in interaction with intrinsic structural defects.
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