Abstract

The oxidation of iron and chromium that are present as impurities in zirconium metal or as alloying elements in Zircaloy-4 was investigated with PhotoElectroChemical techniques (PEC), highlighting the chemical nature, the size and the lateral distribution of Fe and Cr-containing phases in thin zirconia scales formed during the oxidation of pure zirconium and Zircaloy-4 at 470°C in oxygen. In the case of zirconium, iron and chromium impurities led to the formation of oxides distributed in a homogeneous way in the zirconia scale, while in the case of Zircaloy-4 these elements, present in the form of intermetallic particles in the substrate, led to the formation of localised haematite Fe2O3, rhomboedric solid solution (FexCr1−x)2O3 and chromia Cr2O3 phases. These phases were accurately studied via the measurement of their respective band-gap (Fe2O3: 2.2eV, (FexCr1−x)2O3: 2.6eV and Cr2O3: 3.0eV). It is concluded that PEC techniques represent a sensitive and powerful way to locally analyse the various semiconductor phases in the oxide scale at a micron scale.

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