Abstract
Sodium bis(2-ethylhexyl)phosphate (NaDEHP) and sodium bis(2-ethylhexyl)sulfosuccinate (AOT) are studied by atomic-level molecular modeling, using UFF force field and surface tension measurements. Five representative geometries of NaDEHP are shown, and the corresponding structural parameters such as the energy, area, and volume are analyzed. The effects of additives such as NaCl, water-soluble polymer, and alcohol on the surface activity of NaDEHP and AOT solutions are investigated by surface tension measurements. The results suggest the following: (i) The bond angle of the hydrophobic chains of NaDEHP is smaller than that of AOT. (ii) AOT is more sensitive to NaCl than NaDEHP, that is, the surface tension of AOT is obviously decreased as a small amount of NaCl is added, but it has only a slight influence on the NaDEHP system. (iii) Two transition points appear in the surface tension curves of AOT with addition of 0.5 wt % PVP (poly(vinylpyrrolidone)), but in the NaDEHP surface tension curves two transition points appear only when the PVP concentration is high enough, for example, 2.0 wt % in this experiment, which suggests that the interaction between AOT and PVP is stronger than that between NaDEHP and PVP. (iv) The surface tension and critical micelle concentration are decreased with the increase of the carbon number and the concentration of the alcohol. (v) The mean squared end-to-end distance (〈r2〉) of the polymer chain obtained from the simulation is reduced by adding NaDEHP and AOT.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.