Abstract
A comparative study has been made of the isothermal (T = 700 K) and nonisothermal (T from 300 to 700 K) oxidation of Ta-films in air. Parabolic oxidation kinetics were observed for the isothermal study, whilst the nonisothermal oxidation exhibited logarithmic kinetics instead of the expected mixed logarithmic-parabolic characteristics. The isothermal kinetics was fitted to the parabolic equation: d=21(T−9)12−19 (T in min, d in nm). The nonisothermal kinetics for the nucleation period (T 50 min) was fitted to the equation: d=49 In(T−46) + 5, where t0 = RTaK0; a and K0 are constant. The nonisothermal oxidation behaviour is attributed to the relative decrease of importance of oxygen dissolution in comparison to that in isothermal oxidation. Transmission electron microscopy and Auger electron spectroscopy depth profile studies show that thin films are composed of an amorphous solid mixture of Ta2O5, TaO and TaOx (x < 1) during isothermal as well as nonisothermal oxidation.
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