Abstract
A comparative study has been made of the isothermal (T = 700 K) and nonisothermal (T from 300 to 700 K) oxidation of Ta-films in air. Parabolic oxidation kinetics were observed for the isothermal study, whilst the nonisothermal oxidation exhibited logarithmic kinetics instead of the expected mixed logarithmic-parabolic characteristics. The isothermal kinetics was fitted to the parabolic equation: d=21(T−9)12−19 (T in min, d in nm). The nonisothermal kinetics for the nucleation period (T 50 min) was fitted to the equation: d=49 In(T−46) + 5, where t0 = RTaK0; a and K0 are constant. The nonisothermal oxidation behaviour is attributed to the relative decrease of importance of oxygen dissolution in comparison to that in isothermal oxidation. Transmission electron microscopy and Auger electron spectroscopy depth profile studies show that thin films are composed of an amorphous solid mixture of Ta2O5, TaO and TaOx (x < 1) during isothermal as well as nonisothermal oxidation.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
