Abstract
Bonding of two monofunctional silanes, trimethylmethoxysilane and trimethylchlorosilane, was studied on copper surfaces. Polished and silinated surfaces were analyzed using x‐ray photoelectron spectroscopy, glancing angle Fourier transform infrared spectroscopy, and atomic force microscopy. The feasibility of various reactions paths leading to bonding was considered for the two silanes based on the spectroscopic results. The methoxysilane is proposed to form covalent metal siloxane bonds, whereas the chlorosilane removes oxides and hydroxide groups from the surface and forms CuCl. The results imply that chlorosilane forms mainly silanols and siloxane dimers.
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