Abstract
In these ten years, thirteen compact sources whose electron energy is not higher than 1 GeV have been constructed in Japan. Five sources have been developed by Electrotechnical Laboratory jointly with Sumitomo Electric Industries, Ltd. and Kawasaki Heavy Industries, Ltd. It is worth mentioning that the operations of ten rings (NIJI-II, III, IV, NAR, SuperALIS, SORTEC, AURORA, LUNA, JSR, HITACHI) have started since 1988. Recent status of these sources and their intended applications including visible and ultraviolet free electron laser projects using insertion devices installed in TERAS and NIJI-IV are briefly reported and key technologies needed to realize compact sources for ultralarge scale integration lithography and angiography, such as the electron undulating method and long lived, high-current beam storage at the early stage of commissioning, are discussed.
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