Abstract
This article introduces an all-electrostatic electron-beam column which uses conventional electrode assemblies, resulting in a system which is very much smaller than a magnetic lens column. Computer modeling of the electron-optical performance of the column has shown that the concept has promise as a lithography tool. Beam broadening due to electron–electron interactions and aberrations of the final accelerating lens are both small enough to give a resolution which matches that of present-day magnetic columns.
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