Compact 4-kHz XeF laser with a multisectional discharge gap

Abstract

A XeF electric-discharge laser with a pulse repetition rate f of up to 4 kHz is developed. The laser electrode unit is based on plate electrodes with inductive—capacitive discharge stabilisation. He and Ne are used as buffer gases, and NF3 serves as a fluorine donor. A narrow (∼1 mm) discharge is achieved; the specific energy deposition per unit length of the active volume is as high as 2 J m-1. The maximum energy in a laser pulse is ∼3 mJ for NF3—Xe—He and NF3—Xe—Ne mixtures at total pressures of 0.8 and 1.2 atm, respectively, and the maximum lasing efficiency is ∼0.73%. The maximum gas velocity in the working gap is 19 m s-1. The laser-pulse energy at a high pulse repetition rate (4 kHz) virtually coincides with that obtained at a low repetition rate. The mean output pulse power at f = 4 kHz reaches 12 W, and the rms deviation of the laser-pulse energy is ∼2.5%.