Combined reactive plasma jet-laser etching method for technical optical glass containing metal oxides

Abstract

The machining of optical glass materials with beam technologies enables novel fabrication processes for innovative optical elements with freeform surfaces. However, the complex material composition of optical glass such as N-BK7® is challenging for non-abrasive, pure chemical machining. N-BK7 can be machined utilizing reactive atmospheric plasma jet (RAPJ) etching. However, the etching mechanism results in process-inherent surface composition changes that limit potential applications of RAPJ-machining. A residues layer is formed which causes a temporally changing etching behavior and an increased roughness. Therefore, a process sequence of utilizing RAPJ etching and laser cleaning is proposed and demonstrated that enables to overcome the stated limitations. In this cyclic sequence, N-BK7 optical glass is etched first with a fluorine-containing reactive atmospheric plasma jet resulting in an etched but also residues-modified surface. Thereafter, the residues are removed by pulsed UV laser irradiation without ablation of the glass. This combined laser-enhanced reactive plasma jet etching allows etching of optical glass with a higher average etching rate and smoother machined surfaces.