Abstract

The effect of combined gas-phase introduction of vanadium(V) and manganese(IV) oxides on thermal oxidation of InP consists in acceleration of the oxide film formation on the InP samples regardless of the chemostimulators mixture composition. The nonlinear oxide film thickness at the InP surface as a function of the chemostimulators mixture composition has been rationalized as a result of mutual influence of V2O5 and MnO2 changing their heat-induced reactivity and evaporation behavior.

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