Abstract
In this study, four ZnO thin films were deposited on FTO substrates using the sol–gel dip coating method to examine their microstructural, morphological, and optical properties through various techniques. Three of them were subjected to ultraviolet (UV) light, magnetic field (MF), and a combination of UV and MF during deposition, referred as ZnO: UV, ZnO: MF, and ZnO: (UV+MF), respectively. The results obtained showed that the simultaneous UV and MF exposure improved the crystallinity and surface homogeneity of the as-deposited film. Moreover, ZnO: (UV+MF) film exhibited an average transparency of 80% in the visible region and a high optical bandgap (3.67 eV). Room-temperature photoluminescence (PL) spectra revealed a weak UV emission and a strong violet emission peaks for all films. However, the violet emission intensity being lower in ZnO: UV and ZnO: MF films due to a reduction in zinc interstitials (Zni) defects, The simultaneous UV and MF exposure did not reduce Zni defects, and the violet emission intensity was almost identical to that of the untreated film. These findings suggest that the ZnO: (UV+MF) film can be a promising candidate for the development of ultraviolet and violet lasers and light-emitting diodes.
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