Abstract

Abstract: Although effects of short-day treatment and fall fertilization on seedling development have been studied independently, their combined influences are not well elucidated. We explored growth, nutrient concentration, and spring bud break of Chinese pine (Pinus tabulaeformis Carr.) seedlings exposed to two photoperiod treatments (short-day consisting of 3 weeks of 18-hr nights in late summer and ambient day length) and three rates of fall N fertilization (0, 12 and 24 mg N per seedling). Seedlings were assessed before fall fertilization and at the end of the growing season. Bud break timing was evaluated the following spring. Increased foliar P concentration concurrent with reduced root P and K concentration occurred in short-day treated seedlings at the conclusion of photoperiod treatment. By the end of the growing season, short-day treatment resulted in greater N and P concentration in the stems, and P concentration in the foliage. It also induced smaller foliage and stem dry mass in both stages. Fall fertilization consistently enhanced tissue N concentration, but interaction effects with short-day treatment were generally non-significant. Short-day treatment curtailed shoot growth, induced terminal bud set, and hastened spring bud break (by only one day) for this mid-latitude seed source (41° N). Thus, short-day treatment or fall fertilization each promoted an increased nutrient concentration, while having only a minor effect on spring bud break.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.