Abstract
The combination of a key element of soft lithography, namely the elastomericstamp, with the operation principle of step and flash imprint lithography resultsin a moulding procedure allowing high throughput and remarkable operationalsimplicity. 100 nm scale dense features can be fabricated via in situ polymerization of apolyurethane fluid, simultaneous to the capillary penetration into the recessed regions ofhigh-resolution elastomeric elements. Excellent pattern definition has been obtained forfeatures down to 200 nm, with aspect ratio of around unity over areas of the order ofcm2. The physical principles of the fluidic motion within thesub-µm channels are also discussed, to estimate the maximum aspect ratio achievable before thecomplete curing of the employed photopolymer.
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