Combinatorial investigation of Hf–Ta thin films and their anodic oxides

Abstract

A co-sputtering technique was used for the fabrication of a thin film combinatorial library (Hf–21 at.% Ta to 91 at.% Ta) based on alloying of Hf and Ta. The microstructure and crystallography of individual metallic alloy compositions were analyzed using SEM and XRD mapping, respectively. Three different zones of microstructure were identified within the range of alloys, going from hexagonal to tetragonal through an intermediate amorphous region. The local oxidation of Hf–Ta parent metal alloys at different compositions was investigated in steps of 1 at.% using an automated scanning droplet cell in the confined droplet mode. Potentiodynamic anodisation cycles combined with in situ impedance spectroscopy provide basic knowledge regarding the oxide formation and corresponding electrical properties. Dielectric constants were mapped for the entire composition range and XPS depth profiles allowed investigation of the oxide compositions.