Combinatorial Deposition Using Single Arc Plasma Gun

Abstract

This paper describes a combinatorial deposition method using single arc plasma gun (APG). Previously there is combinatorial arc plasma deposition (CAPD) which uses three APGs by turns to deposit a composition grade thin film. In this research, in order to make this CAPD more simply and compact, deposition of composition grade thin film was tried by single APG using alloy cathode. As the results, using the alloy cathode of Pd-Si with which an atomic weight differs about three times, the almost constant compositionally-graded thin film of 14.2 to 85.5 at.% was obtained. On the other hand, in the alloy cathode of Cu-Zn in which an atomic weight is almost same, the compositionally-graded thin film of 59.7 to 81.1 at.% was obtained. It was about 5% of composition grade in large region. It is possible to deposit a compositionally-graded thin film by single APG using alloy cathode which have greatly different atomic weight. The principle of the deposition for compositionally-graded thin film is similar to mass spectrometry.