Abstract
Epitaxial La0.8Ca0.2MnO3 (LCMO) thin films with varied thicknesses were successfully grown on 0.7Pb(Mg1/3Nb2/3)O3-0.3PbTiO3 (PMN-PT) substrates with pulsed-laser deposition. Due to a large lattice mismatch between LCMO and PMN-PT, in-plane tensile strain was introduced into the LCMO layers. The tensile strain could be controlled by varying the layer thickness of LCMO. It was found that the in-plane tensile strain in LCMO layers could enhance the electroresistance (ER) effect significantly. A maximum value of ER ((R10 μA−R1 mA)/R10 μA×100%) was found to be ∼80% in a 10 nm thick LCMO film that suffered a 2.21% in-plane tensile strain. The mechanism for the impact of strain on the ER effect is discussed within the framework of the electron-lattice coupling and the phase separation scenario.
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