Abstract
For most reactive radio-frequency plasma etching processing, the plasma sheaths near two electrodes are asymmetric due to the powered electrode area being smaller than the grounded electrode area. Taking collisional effects of ions with neutrals in the sheaths into account, a selfconsistent dynamic model is proposed here to describe the characteristics of radio-frequency sheaths. Numerical results show the collisional effects on some physical quantities, such as instantaneous voltages on the electrodes, instantaneous thicknesses of the electron sheathes, spatial distributions of the ion density and the electric field in the sheaths, and instantaneous voltage difference between two electrodes.
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