Abstract
Abstract Larger spectral bandwidth and higher photon flux density are the major advantages of multilayer monochromators over crystal-based devices. Especially for synchrotron-based hard X-ray microimaging applications the increased photon flux density is important in order to achieve high contrast and resolution in space and/or time. However, the modifications on the beam profile induced by reflection on a multilayer are a drawback which can seriously harm the performance of such a monochromator. A recent study [A. Rack, T. Weitkamp, M. Riotte, D. Grigoriev, T. Rack, L. Helfen, T. Baumbach, R. Dietsch, T. Holz, M. Kramer, F. Siewert, M. Meduňa, P. Cloetens, E. Ziegler, J. Synchrotron Radiat. 17 (2010) 496–510] has shown that the modifications in terms of beam flatness and coherence preservation can be influenced via the material composition of the multilayer coating. The present article extends this knowledge by studying further material compositions used on a daily basis for hard X-ray monochromatization at the beamline ID19 of the European Synchrotron Radiation Facility.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
