Cobalt oxide thin films prepared by metalorganic chemical vapor deposition from cobalt acetylacetonate

Abstract

Thin films of cobalt oxide have been deposited on various substrates, such as glass, Si(100), SrTiO 3 (100), and LaAlO 3 (100), by low pressure metalorganic chemical vapor deposition (MOCVD) using cobalt(II) acetylacetonate as the precursor. Films obtained in the temperature range 400-600°C were uniform and highly crystalline having Co 3 O 4 phase as revealed by x-ray diffraction. Under similar conditions of growth, highly oriented thin films of cobalt oxide grow on SrTiO 3 (100) and LaAlO 3 (100). The microstructure and the surface morphology of cobalt oxide films on glass, Si(100) and single crystalline substrates, SrTiO 3 (100) and LaAlO 3 (100) were studied by scanning electron microscopy. Optical properties of the films were studied by uv-visible-near IR spectrophotometry.