Abstract
Copper clusters, deposited by evaporation onto highly oriented pyrolytic graphite (HOPG) and Dow Cyclotene, a low permittivity polymer, have been found to coalesce through surface diffusion at room temperature. We study this process by x-ray photoelectron spectroscopy under ultrahigh vacuum conditions, where cluster growth was measured through photoelectron emission intensity changes. Using a simple model, the coalescence (as opposed to diffusion) coefficients were determined for both untreated and Ar+-treated substrates. It was found that Ar+ treatment results in reductions in both coalescence coefficient and cluster size due to increased cluster/surface interaction. The atypical coalescence behavior of Cu on untreated HOPG is shown to be due to an absence of interfacial interaction.
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