Abstract
Copper clusters, deposited by evaporation onto highly oriented pyrolytic graphite (HOPG) and Dow Cyclotene, a low permittivity polymer, have been found to coalesce through surface diffusion at room temperature. We study this process by x-ray photoelectron spectroscopy under ultrahigh vacuum conditions, where cluster growth was measured through photoelectron emission intensity changes. Using a simple model, the coalescence (as opposed to diffusion) coefficients were determined for both untreated and Ar+-treated substrates. It was found that Ar+ treatment results in reductions in both coalescence coefficient and cluster size due to increased cluster/surface interaction. The atypical coalescence behavior of Cu on untreated HOPG is shown to be due to an absence of interfacial interaction.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.